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Showing 1–15 of 261 results

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    291 FLUX™

    A mildly activated flux for use prior to hot oil fusing. 291 FLUX is formulated without isopropyl alcohol, making it safer to use and store. It is compatible with THERMO FLO® and PRO FUSE Fusing / Leveling fluids. 291 FLUX contains ingredients used in the fusing fluids, which results in reduced consumption and prolongs the life of the fusing fluids.

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    7% HYDROGEN PEROXIDE

    A stabilized peroxide solution used to control and kill biological growth in the fountain solution press mix and/or water. HYDROGEN PEROXIDE is an effective agent that addresses growth issues without causing any printing issues. HYDROGEN PEROXIDE contains additives to stabilize and improve its effectiveness.

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    ACTI-FLO™

    A mildly activated, water soluble flux for use prior to hot oil pot fusing. ACTI-FLO is formulated to be compatible with THERMO FLO® and PRO FUSE. It contains ingredients used in the fusing fluids, which results in reduced consumption and extended fluid life as the flux is dragged in. It provides consistent surface smoothness, even for hardto-fuse areas and is non-foaming.

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    ADC-45N

    A one-part concentrate (45% potassium carbonate) formulated to develop fully aqueous dry film photoresist. It is economical to use and easy to handle, eliminating the need to weigh and dissolve powdered materials. ADC 45N also works well for developing aqueous photoimageable solder masks, or other applications where carbonate is used.

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    ADC™ 40

    A one-part concentrate (40% potassium carbonate) formulated to develop fully aqueous dry film photoresist. It is economical to use and easy to handle, eliminating the need to weigh and dissolve powdered materials. ADC 40 also works well for developing aqueous photoimageable solder masks, or other applications where carbonate is used.

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    ADC™47

    A one-part concentrate (47% potassium carbonate) formulated to develop fully aqueous dry film photoresists. ADC-47 is economical to use and easy to handle, eliminating the need to weigh and dissolve powdered materials. ADC-47 also works well for developing aqueous photoimageable solder masks or for any other situation where carbonate is used.

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    ADF™10 BAT

    Specially formulated to remove semi-and fully aqueous dry film and screen ink resists. ADF-10 BAT will generally break dry films into very minute particles. It contains copper brightening agents for uniform, clean copper appearance. ADF-10 BAT contains additional copper brightening and antitarnish agents to preserve a bright copper surface for increased etching capability and to protect the copper surface if boards are held in a corrosive environment.

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    ADF™25

    Formulated for outstanding performance on today’s newest dry film resists in spray or soak applications. ADF-25 breaks dry films into particles suitable for filtration. It also protects the panels from staining caused by dyes in the photoresist. ADF-25 demonstrates consistently high loading capabilities, and contains an enhanced copper brightening and antitarnish package. This enables it to produce a bright, uniform copper surface for automatic optical inspection and better etching characteristics.

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    ADF™25C

    A highly concentrated product formulated to remove today’s newest dry film resists in soak or spray applications, at 5% concentration. ADF-25C breaks dry films into particles suitable for filtration. It also protects panels from staining caused by dyes in the photoresists. ADF-25C demonstrates consistently high loading capabilities and contains an enhanced copper brightening and antitarnish package. This enables it to produce bright, uniform copper surface for automatic optical inspection and better etching capabilities.

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    ADF™30

    A photoresist stripper formulated to remove a wide variety of aqueous photoresists. ADF30 provides fast strip speeds and contains brightening and antitarnish agents for a uniform copper surface for automatic optical inspection and better etching characteristics. It produces filterable particles and contains no glycol ethers for a safer working environment. Effective in soak or spray applications.

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    ADF™72

    A photoresist stripper formulated to remove a wide variety of fully aqueous photo resists in a spray application. ADF-72 provides fast strip speeds and contains brightening and antitarnish agents for a uniform copper surface for automatic optical inspection and better etching characteristics. It produces filterable particles for extended bath life

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    Alkaline Descale™

    Alkaline Descale is a strongly oxidizing surface conditioner designed to descale cobalt/chromium and other chromium based alloys before chemical polishing or electropolishing using CoCr Cleaner (RDZ-1881) or ElectroPolish Ti2 (RDZ-1676), respectively. It will convert insoluble oxides to soluble forms and thus assure uniform subsequent processing. Alkaline Descale is provided in two parts, A and B.

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    ANTI STRIPPING SOLUTION

    An acidic fountain press mix additive to help control stripping of ink in the rollers. ANTI STRIPPING SOLUTION is designed to be added to any press mix for improved performance and elimination of roller stripping.

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    ANTIFOAM

    An additive to reduce and eliminate foaming problems in high agitation fountain solution recirculating systems. ANTIFOAM Fountain Additive is highly concentrated to control foaming with minimal usage.

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    ANTIFOAM BB™

    A blended organic defoaming surfactant for use in reducing foam generated in spray equipment. ANTIFOAM BB is especially effective in solutions used for developing and stripping aqueous and semi-aqueous dry film photoresists. Effective at low temperatures of 80?-130? F.

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