Inner Layer Processing Chemicals

RBP Chemical Technology is a leader in developing chemistry for inner layer processing chemicals.

Browse the table below to learn more about our inner layer processing chemicals.


ProductDescriptionDetails
SUR CLEAN™ 92Acid Copper Cleaner/MicroetchAn acid, sprayable cleaner and microetch. SUR CLEAN 92 removes a minute portion of metallic …Electronics, Hot Air Leveling, Microetchants, Copper Cleaning, Inner Layer Processing, Outer Layer Processing
ULTRACLEAN™ NFNon-Foaming Alkaline Spray CleanerFormulated to remove dirt, oil, fingerprints and other soils from copper surfaces without etching the …Electronics, Adhesion Promotion, Copper Cleaning, Inner Layer Processing, Outer Layer Processing
PREPBONDAlkaline Cleaner for Resist Strip ResiduesAn alkaline cleaner for use in the LAYERBOND 2000 adhesion promoter process. PREPBOND provides complete …Electronics, Adhesion Promotion, Copper Cleaning, Inner Layer Processing, Outer Layer Processing
QUANTUM ETCH™Stabilized Hydrogen Peroxide SolutionA stabilized peroxide product for use with sulfuric acid to form a peroxide/sulfuric microetch. QUANTUM …Electronics, Adhesion Promotion, Hot Air Leveling, Microetchants, Copper Cleaning, Inner Layer Processing, Outer Layer Processing
MAGNABOND™ CO-300Copper Oxide ProcessA copper oxide process uniquely formulated to produce a variety of oxide coatings ranging from …Electronics, Adhesion Promotion, Copper Cleaning, Inner Layer Processing, Copper Oxide
MAGNABOND™ OxAltOxide Alternative Adhesion PromoterMAGNABOND OxAlt is a three-part micro-etch additive designed to promote mechanical copper-epoxy bonding by optimizing …Electronics, Adhesion Promotion, Copper Cleaning, Inner Layer Processing, Copper Oxide
ME 515LLiquid Persulfate Copper MicroetchA liquid persulfate-based copper microetch that is pre-mixed with sulfuric acid. ME 515L removes copper …Electronics, Hot Air Leveling, Microetchants, Copper Cleaning, Inner Layer Processing, Outer Layer Processing
LAYER CLEAN™ CRAcid Cleaner for Enhanced Chromate RemovalAn acid, non-etching cleaner that provides the most effective removal of chromate conversion coating from …Electronics, Copper Cleaning, Inner Layer Processing, Outer Layer Processing
LAYER CLEAN™ NPPhosphate-Free Acid Cleaner for Enhanced Chromate RemovalAn acid, non-etching cleaner that provides the most effective removal of chromate conversion coating from …Electronics, Copper Cleaning, Inner Layer Processing
DUAL STRIP™ BATResist and Ink StripperFormulated to remove fully aqueous dry films and screen ink resists in soak or spray …Electronics, Resist Stripper, Inner Layer Processing
DX™ STRIP BATResist and Ink StripperProvides additional antitarnish protection while removing fully aqueous liquid photoresists in spray or soak applications. …Electronics, Resist Stripper, Inner Layer Processing, Outer Layer Processing
DX™40Aqueous Developer ConcentrateA one-part concentrate (40% potassium carbonate) formulated to develop fully aqueous dry film photoresists. DX-40 …Electronics, Inner Layer Processing, Outer Layer Processing, Developing
DX™45Developer Replenisher ConcentrateA one-part concentrate (45% potassium carbonate) formulated to develop fully aqueous dry film photoresists and …Electronics, Inner Layer Processing, Outer Layer Processing, Developing
DX™45 HWAqueous Developer Concentrate for Hard WaterA liquid 45% potassium carbonate concentrate formulated to develop fully aqueous dry film photoresists and …Electronics, Inner Layer Processing, Outer Layer Processing, Developing
DX™45 NHAqueous Developer ConcentrateA liquid 45% potassium carbonate concentrate formulated to develop fully aqueous dry film photoresists and …Electronics, Inner Layer Processing, Outer Layer Processing, Developing
DX™45 PLUSEnhanced Developer ReplenisherA one-part concentrate formulated to develop fully aqueous dry film photoresists and photoimageable solder masks. …Electronics, Inner Layer Processing, Outer Layer Processing, Developing
ADC-45NAqueous Developer ConcentrateA one-part concentrate (45% potassium carbonate) formulated to develop fully aqueous dry film photoresist. It …Electronics, Inner Layer Processing, Outer Layer Processing, Developing
ADC™ 40Aqueous Developer ConcentrateA one-part concentrate (40% potassium carbonate) formulated to develop fully aqueous dry film photoresist. It …Electronics, Inner Layer Processing, Outer Layer Processing, Developing
ADC™47Aqueous Developer ConcentrateA one-part concentrate (47% potassium carbonate) formulated to develop fully aqueous dry film photoresists. ADC-47 …Electronics, Inner Layer Processing, Outer Layer Processing, Developing
ADF™72Aqueous Resist StripperA photoresist stripper formulated to remove a wide variety of fully aqueous photo resists in …Electronics, Resist Stripper, Inner Layer Processing, Outer Layer Processing