Outer Layer Processing Chemicals

 

RBP Chemical Technology is a leader in developing chemistry for outer layer processing chemicals.

Browse the table below to learn more about our outer layer processing chemicals.


ProductDescriptionDetails
SODIUM PERSULFATESODIUM PERSULFATESODIUM PERSULFATEElectronics, Microetchants, Copper Cleaning, Outer Layer Processing
SUR CLEAN™ 92Acid Copper Cleaner/MicroetchAn acid, sprayable cleaner and microetch. SUR CLEAN 92 removes a minute portion of metallic …Electronics, Hot Air Leveling, Microetchants, Copper Cleaning, Inner Layer Processing, Outer Layer Processing
ULTRACLEAN™ NFNon-Foaming Alkaline Spray CleanerFormulated to remove dirt, oil, fingerprints and other soils from copper surfaces without etching the …Electronics, Adhesion Promotion, Copper Cleaning, Inner Layer Processing, Outer Layer Processing
PREPBONDAlkaline Cleaner for Resist Strip ResiduesAn alkaline cleaner for use in the LAYERBOND 2000 adhesion promoter process. PREPBOND provides complete …Electronics, Adhesion Promotion, Copper Cleaning, Inner Layer Processing, Outer Layer Processing
QUANTUM ETCH™Stabilized Hydrogen Peroxide SolutionA stabilized peroxide product for use with sulfuric acid to form a peroxide/sulfuric microetch. QUANTUM …Electronics, Adhesion Promotion, Hot Air Leveling, Microetchants, Copper Cleaning, Inner Layer Processing, Outer Layer Processing
ResiStrip™ MNDHigh Performance Photoresist Stripper RDZ-1403ResiStrip™ MND is designed to completely remove LDI photoresist from Copper and Copper based substrates. …Electronics, Resist Stripper, Outer Layer Processing
MicroClean™ CuLAlkaline Copper and Iron Alloy Spray CleanerMicroClean CuL is a micro-cleaner” that is designed to remove extremely tenacious soils from copperElectronics, Copper Cleaning, Outer Layer Processing
MicroClean™ CuLXAlkaline Copper and Iron Alloy Soak CleanerMicroClean CuLX is a micro-cleaner” that is designed to remove extremely tenacious soils from copperElectronics, Copper Cleaning, Outer Layer Processing
MICROSTRIP™ 2000Fine Line Resist StripperA semi-aqueous photoresist stripper for stripping very fine line circuit boards. MICROSTRIP 2000 contains additives …Electronics, Resist Stripper, Outer Layer Processing
Microstrip™ONEFine Line Resist StripperA fully aqueous based resist stripper designed to remove the most tenacious resists. Microstrip™ONE turns …Electronics, Resist Stripper, Outer Layer Processing
ME 515LLiquid Persulfate Copper MicroetchA liquid persulfate-based copper microetch that is pre-mixed with sulfuric acid. ME 515L removes copper …Electronics, Hot Air Leveling, Microetchants, Copper Cleaning, Inner Layer Processing, Outer Layer Processing
LAYER CLEAN™ CRAcid Cleaner for Enhanced Chromate RemovalAn acid, non-etching cleaner that provides the most effective removal of chromate conversion coating from …Electronics, Copper Cleaning, Inner Layer Processing, Outer Layer Processing
DX™ STRIP BATResist and Ink StripperProvides additional antitarnish protection while removing fully aqueous liquid photoresists in spray or soak applications. …Electronics, Resist Stripper, Inner Layer Processing, Outer Layer Processing
DX™40Aqueous Developer ConcentrateA one-part concentrate (40% potassium carbonate) formulated to develop fully aqueous dry film photoresists. DX-40 …Electronics, Inner Layer Processing, Outer Layer Processing, Developing
DX™45Developer Replenisher ConcentrateA one-part concentrate (45% potassium carbonate) formulated to develop fully aqueous dry film photoresists and …Electronics, Inner Layer Processing, Outer Layer Processing, Developing
DX™45 HWAqueous Developer Concentrate for Hard WaterA liquid 45% potassium carbonate concentrate formulated to develop fully aqueous dry film photoresists and …Electronics, Inner Layer Processing, Outer Layer Processing, Developing
DX™45 NHAqueous Developer ConcentrateA liquid 45% potassium carbonate concentrate formulated to develop fully aqueous dry film photoresists and …Electronics, Inner Layer Processing, Outer Layer Processing, Developing
DX™45 PLUSEnhanced Developer ReplenisherA one-part concentrate formulated to develop fully aqueous dry film photoresists and photoimageable solder masks. …Electronics, Inner Layer Processing, Outer Layer Processing, Developing
ADC-45NAqueous Developer ConcentrateA one-part concentrate (45% potassium carbonate) formulated to develop fully aqueous dry film photoresist. It …Electronics, Inner Layer Processing, Outer Layer Processing, Developing
ADC™ 40Aqueous Developer ConcentrateA one-part concentrate (40% potassium carbonate) formulated to develop fully aqueous dry film photoresist. It …Electronics, Inner Layer Processing, Outer Layer Processing, Developing
ADC™47Aqueous Developer ConcentrateA one-part concentrate (47% potassium carbonate) formulated to develop fully aqueous dry film photoresists. ADC-47 …Electronics, Inner Layer Processing, Outer Layer Processing, Developing
ADF™10 BATSemi Aqueous Resist Stripper With AntitarnishSpecially formulated to remove semi-and fully aqueous dry film and screen ink resists. ADF-10 BAT …Electronics, Resist Stripper, Outer Layer Processing
ADF™25Aqueous Photoresist StripperFormulated for outstanding performance on today’s newest dry film resists in spray or soak applications. …Electronics, Resist Stripper, Outer Layer Processing
ADF™25CAqueous Photoresist Stripper ConcentrateA highly concentrated product formulated to remove today’s newest dry film resists in soak or …Electronics, Resist Stripper, Outer Layer Processing
ADF™30Aqueous Resist StripperA photoresist stripper formulated to remove a wide variety of aqueous photoresists. ADF30 provides fast …Electronics, Resist Stripper, Outer Layer Processing
ADF™72Aqueous Resist StripperA photoresist stripper formulated to remove a wide variety of fully aqueous photo resists in …Electronics, Resist Stripper, Inner Layer Processing, Outer Layer Processing