Outer Layer Processing Chemicals

 

RBP Chemical Technology is a leader in developing chemistry for outer layer processing chemicals.

Browse the table below to learn more about our outer layer processing chemicals.


ProductDescriptionDetailsproduct_cat_hfilter
ADF-55AcceleratorFormulated to remove fully aqueous dry films and liquid resists in soak or spray applications. …electronics-chemicals outer-layer-processing resist-stripper
SODIUM PERSULFATESODIUM PERSULFATESODIUM PERSULFATEcopper-cleaning electronics-chemicals microetchants outer-layer-processing
SUR CLEAN™ 92Acid Copper Cleaner/MicroetchAn acid, sprayable cleaner and microetch. SUR CLEAN 92 removes a minute portion of metallic …copper-cleaning electronics-chemicals hot-air-leveling inner-layer-processing microetchants outer-layer-processing fusing-leveling
ULTRACLEAN™ NFNon-Foaming Alkaline Spray CleanerFormulated to remove dirt, oil, fingerprints and other soils from copper surfaces without etching the …adhesion-promotion copper-cleaning electronics-chemicals inner-layer-processing outer-layer-processing
PREPBOND™Alkaline Cleaner for Resist Strip ResiduesAn alkaline cleaner for use in the LAYERBOND 2000 adhesion promoter process. PREPBOND provides complete …adhesion-promotion copper-cleaning electronics-chemicals inner-layer-processing outer-layer-processing
QUANTUM ETCH™Stabilized Hydrogen Peroxide SolutionA stabilized peroxide product for use with sulfuric acid to form a peroxide/sulfuric microetch. QUANTUM …adhesion-promotion copper-cleaning electronics-chemicals hot-air-leveling inner-layer-processing microetchants outer-layer-processing fusing-leveling
ResiStrip™ MNDHigh Performance Photoresist Stripper RDZ-1403ResiStrip MND is designed to completely remove LDI photoresist from Copper and Copper based substrates. …electronics-chemicals outer-layer-processing resist-stripper
MicroClean™ CuLAlkaline Copper and Iron Alloy Spray CleanerMicroClean CuL is a micro-cleaner that is designed to remove extremely tenacious soils from coppercopper-cleaning electronics-chemicals outer-layer-processing
MicroClean™ CuLXAlkaline Copper and Iron Alloy Soak CleanerMicroClean CuLX is a micro-cleaner that is designed to remove extremely tenacious soils from coppercopper-cleaning electronics-chemicals outer-layer-processing
MICROSTRIP™ 2000Fine Line Resist StripperA semi-aqueous photoresist stripper for stripping very fine line circuit boards. MICROSTRIP 2000 contains additives …electronics-chemicals outer-layer-processing resist-stripper
Microstrip™ONEFine Line Resist StripperA fully aqueous based resist stripper designed to remove the most tenacious resists. Microstrip ONE …electronics-chemicals outer-layer-processing resist-stripper
ME 515LLiquid Persulfate Copper MicroetchA liquid persulfate-based copper microetch that is pre-mixed with sulfuric acid. ME 515L removes copper …copper-cleaning electronics-chemicals hot-air-leveling inner-layer-processing microetchants outer-layer-processing fusing-leveling
LAYER CLEAN™ CRAcid Cleaner for Enhanced Chromate RemovalAn acid, non-etching cleaner that provides the most effective removal of chromate conversion coating from …copper-cleaning electronics-chemicals inner-layer-processing outer-layer-processing
DX™ STRIP BATResist and Ink StripperProvides additional antitarnish protection while removing fully aqueous liquid photoresists in spray or soak applications. …electronics-chemicals inner-layer-processing outer-layer-processing resist-stripper
DX™40Aqueous Developer ConcentrateA one-part concentrate (40% potassium carbonate) formulated to develop fully aqueous dry film photoresists. DX-40 …developing electronics-chemicals inner-layer-processing outer-layer-processing
DX™45Developer Replenisher ConcentrateA one-part concentrate (45% potassium carbonate) formulated to develop fully aqueous dry film photoresists and …developing electronics-chemicals inner-layer-processing outer-layer-processing
DX™45 HWAqueous Developer Concentrate for Hard WaterA liquid 45% potassium carbonate concentrate formulated to develop fully aqueous dry film photoresists and …developing electronics-chemicals inner-layer-processing outer-layer-processing
DX™45 NHAqueous Developer ConcentrateA liquid 45% potassium carbonate concentrate formulated to develop fully aqueous dry film photoresists and …developing electronics-chemicals inner-layer-processing outer-layer-processing
DX™45 PLUSEnhanced Developer ReplenisherA one-part concentrate formulated to develop fully aqueous dry film photoresists and photoimageable solder masks. …developing electronics-chemicals inner-layer-processing outer-layer-processing