Outer Layer Processing Chemicals

 

RBP Chemical Technology is a leader in developing chemistry for outer layer processing chemicals.

Browse the table below to learn more about our outer layer processing chemicals.


ProductDescriptionDetailsproduct_cat_hfilter
SODIUM PERSULFATESODIUM PERSULFATESODIUM PERSULFATEelectronics-chemicals microetchants copper-cleaning outer-layer-processing
SUR CLEAN™ 92Acid Copper Cleaner/MicroetchAn acid, sprayable cleaner and microetch. SUR CLEAN 92 removes a minute portion of metallic …electronics-chemicals hot-air-leveling microetchants copper-cleaning inner-layer-processing outer-layer-processing
ULTRACLEAN™ NFNon-Foaming Alkaline Spray CleanerFormulated to remove dirt, oil, fingerprints and other soils from copper surfaces without etching the …electronics-chemicals adhesion-promotion copper-cleaning inner-layer-processing outer-layer-processing
PREPBONDAlkaline Cleaner for Resist Strip ResiduesAn alkaline cleaner for use in the LAYERBOND 2000 adhesion promoter process. PREPBOND provides complete …electronics-chemicals adhesion-promotion copper-cleaning inner-layer-processing outer-layer-processing
QUANTUM ETCH™Stabilized Hydrogen Peroxide SolutionA stabilized peroxide product for use with sulfuric acid to form a peroxide/sulfuric microetch. QUANTUM …electronics-chemicals adhesion-promotion hot-air-leveling microetchants copper-cleaning inner-layer-processing outer-layer-processing
ResiStrip™ MNDHigh Performance Photoresist Stripper RDZ-1403ResiStrip MND is designed to completely remove LDI photoresist from Copper and Copper based substrates. …electronics-chemicals resist-stripper outer-layer-processing
MicroClean™ CuLAlkaline Copper and Iron Alloy Spray CleanerMicroClean CuL is a micro-cleaner that is designed to remove extremely tenacious soils from copperelectronics-chemicals copper-cleaning outer-layer-processing
MicroClean™ CuLXAlkaline Copper and Iron Alloy Soak CleanerMicroClean CuLX is a micro-cleaner that is designed to remove extremely tenacious soils from copperelectronics-chemicals copper-cleaning outer-layer-processing
MICROSTRIP™ 2000Fine Line Resist StripperA semi-aqueous photoresist stripper for stripping very fine line circuit boards. MICROSTRIP 2000 contains additives …electronics-chemicals resist-stripper outer-layer-processing
Microstrip™ONEFine Line Resist StripperA fully aqueous based resist stripper designed to remove the most tenacious resists. Microstrip ONE …electronics-chemicals resist-stripper outer-layer-processing
ME 515LLiquid Persulfate Copper MicroetchA liquid persulfate-based copper microetch that is pre-mixed with sulfuric acid. ME 515L removes copper …electronics-chemicals hot-air-leveling microetchants copper-cleaning inner-layer-processing outer-layer-processing
LAYER CLEAN™ CRAcid Cleaner for Enhanced Chromate RemovalAn acid, non-etching cleaner that provides the most effective removal of chromate conversion coating from …electronics-chemicals copper-cleaning inner-layer-processing outer-layer-processing
DX™ STRIP BATResist and Ink StripperProvides additional antitarnish protection while removing fully aqueous liquid photoresists in spray or soak applications. …electronics-chemicals resist-stripper inner-layer-processing outer-layer-processing
DX™40Aqueous Developer ConcentrateA one-part concentrate (40% potassium carbonate) formulated to develop fully aqueous dry film photoresists. DX-40 …electronics-chemicals inner-layer-processing outer-layer-processing developing
DX™45Developer Replenisher ConcentrateA one-part concentrate (45% potassium carbonate) formulated to develop fully aqueous dry film photoresists and …electronics-chemicals inner-layer-processing outer-layer-processing developing
DX™45 HWAqueous Developer Concentrate for Hard WaterA liquid 45% potassium carbonate concentrate formulated to develop fully aqueous dry film photoresists and …electronics-chemicals inner-layer-processing outer-layer-processing developing
DX™45 NHAqueous Developer ConcentrateA liquid 45% potassium carbonate concentrate formulated to develop fully aqueous dry film photoresists and …electronics-chemicals inner-layer-processing outer-layer-processing developing
DX™45 PLUSEnhanced Developer ReplenisherA one-part concentrate formulated to develop fully aqueous dry film photoresists and photoimageable solder masks. …electronics-chemicals inner-layer-processing outer-layer-processing developing
ADC-45NAqueous Developer ConcentrateA one-part concentrate (45% potassium carbonate) formulated to develop fully aqueous dry film photoresist. It …electronics-chemicals inner-layer-processing outer-layer-processing developing
ADC™ 40Aqueous Developer ConcentrateA one-part concentrate (40% potassium carbonate) formulated to develop fully aqueous dry film photoresist. It …electronics-chemicals inner-layer-processing outer-layer-processing developing
ADC™47Aqueous Developer ConcentrateA one-part concentrate (47% potassium carbonate) formulated to develop fully aqueous dry film photoresists. ADC …electronics-chemicals inner-layer-processing outer-layer-processing developing
ADF™10 BATSemi Aqueous Resist Stripper With AntitarnishSpecially formulated to remove semi-and fully aqueous dry film and screen ink resists. ADF 10 …electronics-chemicals resist-stripper outer-layer-processing
ADF™25Aqueous Photoresist StripperFormulated for outstanding performance on today’s newest dry film resists in spray or soak applications. …electronics-chemicals resist-stripper outer-layer-processing
ADF™25CAqueous Photoresist Stripper ConcentrateA highly concentrated product formulated to remove today’s newest dry film resists in soak or …electronics-chemicals resist-stripper outer-layer-processing
ADF™30Aqueous Resist StripperA photoresist stripper formulated to remove a wide variety of aqueous photoresists. ADF 30 provides …electronics-chemicals resist-stripper outer-layer-processing
ADF™72Aqueous Resist StripperA photoresist stripper formulated to remove a wide variety of fully aqueous photo resists in …electronics-chemicals resist-stripper inner-layer-processing outer-layer-processing