Resist Stripper

 

Showing all 12 results

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    ADF-55

    Formulated to remove fully aqueous dry films and liquid resists in soak or spray
    applications. ADF-55 breaks dry films into particles suitable for filtration and has a low
    VOC content for reduced air emissions. ADF-55 contains special copper brightening and
    antitarnish agents that produce a bright, uniform copper surface for automatic optical
    inspection and better etching characteristics.

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    DUAL STRIP™ BAT

    Formulated to remove fully aqueous dry films and screen ink resists in soak or spray applications. DUAL STRIP will generally break dry films into particles suitable for filtration. DUAL STRIP has a low VOC content for reduced air emissions. DUAL STRIP BAT contains additional copper brightening and antitarnish agents that produce a bright, uniform copper surface for automatic optical inspection and better etching characteristics.

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    DUAL STRIP™ CONCENTRATE

    Additive for pH Control

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    DX™ STRIP BAT

    Provides additional antitarnish protection while removing fully aqueous liquid photoresists in spray or soak applications. DX STRIP BAT is also effective on aqueous dry film photoresists, and on a combination of liquid and dry film resists being stripped in the same process. It will generally break dry films into particles suitable for filtration. DX STRIP BAT has a low VOC content for reduced air emissions.

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    LDI Strip 77

    LDI Strip 77 is a semi-aqueous photoresist stripper formulated for stripping very fine line circuit boards. It provides fast and complete resist removal and contains additives that protect metal surfaces against corrosion, including copper and tin. It can be used in both spray and soak applications.

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    MICROSTRIP™ 2000

    A semi-aqueous photoresist stripper for stripping very fine line circuit boards. MICROSTRIP 2000 contains additives that increase penetration into small lines and spaces, significantly improving removal. It provides fast strip speeds and contains copper brightening and antitarnish agents which produce a bright, uniform copper surface for automatic optical inspection and better etching characteristics. For use in spray and soak applications.

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    Microstrip™ONE

    A fully aqueous based resist stripper designed to remove the most tenacious resists. Microstrip ONE turns resist into fine particles to ensure the complete removal of it from extremely narrow line spacing (<4 mils) and from underneath over-plated areas. Microstrip ONE contains copper anti-tarnish agents for better etching characteristics.

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    ResiStrip™ 5000

    ResiStrip 5000 is designed to strip difficult to remove photoresists and LDI films quickly, thoroughly and economically. The stripped board is oxidation-free and ready for oxide or etching.

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    RESISTRIP™ CONCENTRATE

    High Speed Dry Film Photoresist Stripper for Industrial Use Only

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    ResiStrip™ MND

    ResiStrip MND is designed to completely remove LDI photoresist from Copper and
    Copper based substrates. LDI forms powerful chemical bonds to substrate Copper, and
    requires a formula designed to break these bonds. ResiStrip MND is specifically
    formulated to remove photoresist particles that have become lodged in tight mil spaces.
    Removing these particles with conventional photoResist Stripper systems is difficult and
    nearly impossible. ResiStrip MND can be used following less expensive stripping
    systems that remove the bulk of the photoresist, without rinsing between strippers.
    ResiStrip MND will leave Copper in a bright, tarnish-free condition.

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    ResiStrip™ VMND

    ResiStrip VMND is designed to completely remove LDI photoresist from Copper and
    Copper based substrates. LDI forms powerful chemical bonds to substrate Copper, and
    requires a formula designed to break these bonds. ResiStrip VMND is specifically
    formulated to remove photoresist particles that have become lodged in tight mil spaces.
    Removing these particles with conventional photoResist Stripper systems is difficult and
    nearly impossible. Replenishing ResiStrip VMND can be done using a special additive,
    ResiStrip Maintain (RDZ-2066), instead of the start-up stripper, which cuts
    replenishment costs dramatically, and maintains full stripping performance. ResiStrip
    VMND leaves Copper in a bright, tarnish-free condition.

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    SEMICON RESIST STRIP

    A highly concentrated product formulated to remove today’s newest dry film resists in
    soak or spray applications, at 5% concentration. SEMICON RESIST STRIP breaks dry
    films into particles suitable for filtration. It also protects panels from staining caused by
    dyes in the photoresists. SEMICON RESIST STRIP demonstrates consistently high
    loading capabilities.