Formulated for outstanding performance on today’s newest dry film resists in spray or soak applications. ADF 25 breaks dry films into particles suitable for filtration. It also protects the panels from staining caused by dyes in the photoresist. ADF 25 demonstrates consistently high loading capabilities, and contains an enhanced copper brightening and antitarnish package. This enables it to produce a bright, uniform copper surface for automatic optical inspection and better etching characteristics.
A blended organic defoaming surfactant for use in reducing foam generated in spray equipment. ANTIFOAM BB is especially effective in solutions used for developing and stripping aqueous and semi-aqueous dry film photoresists. Effective at low temperatures of 80?-130? F.
ChemBond 300 is a single step, acidic cleaner and adhesion promoter for inner layers, flex material and rigid laminate prior to resist lamination. It removes oxidation, light organic soil and the chromate conversion coating. ChemBond 300 forms a surface treatment that resists tarnishing and enhances Resist Stripper, eliminating resist lockon. It will not act as a microetch.