A concentrated alkaline equipment cleaner designed to clean conveyorized processing equipment. TIDYLINE EQ-100 effectively removes such process foulants as dry film photoresist scum and stains, etchant residue, and hard water scale.
A photoresist stripper formulated to remove a wide variety of aqueous photoresists. ADF 30 provides fast strip speeds and contains brightening and antitarnish agents for a uniform copper surface for automatic optical inspection and better etching characteristics. It produces filterable particles and contains no glycol ethers for a safer working environment. Effective in soak or spray applications.
A one-part concentrate (47% potassium carbonate) formulated to develop fully aqueous dry film photoresists. ADC 47 is economical to use and easy to handle, eliminating the need to weigh and dissolve powdered materials. ADC 47 also works well for developing aqueous photoimageable solder masks or for any other situation where carbonate is used.
An alkaline solution to prepare and condition printed circuit boards for through-hole metallization. CIRCUTEK CC-710 is specially formulated to remove fingerprints, light soil and other contaminates from copper foil. It also conditions hard to catalyze surfaces such as organic resin and glass for subsequent electroless copper deposition. CIRCUTEK CC710 is supplied as a liquid concentrate.